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dc.contributor.authorCassé, Mikaël
dc.contributor.authorGhibaudo, Gérard
dc.date.accessioned2024-05-23T10:13:38Z
dc.date.available2024-05-23T10:13:38Z
dc.date.issued2022
dc.identifierONIX_20240523__66
dc.identifier.urihttps://0-library-oapen-org.catalogue.libraries.london.ac.uk/handle/20.500.12657/90546
dc.description.abstractundefined
dc.languageEnglish
dc.subject.classificationthema EDItEUR::T Technology, Engineering, Agriculture, Industrial processes::TG Mechanical engineering and materials::TGM Materials science::TGMB Engineering thermodynamics
dc.subject.otherEngineering thermodynamics
dc.titleChapter Low Temperature Characterization and Modeling of FDSOI Transistors for Cryo CMOS Applications
dc.typechapter
oapen.identifier.doi10.5772/intechopen.98403
oapen.relation.isPublishedBy09f6769d-48ed-467d-b150-4cf2680656a1*
oapen.relation.isFundedBy178e65b9-dd53-4922-b85c-0aaa74fce079
oapen.collectionEuropean Research Council (ERC)
oapen.grant.number871764
oapen.grant.acronymSEQUENCE


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